เอกสารการประชุมวิชาการและเสนอผลงานวิจัย มหาวิทยาลัยทักษิณ ครั้งที่ 19 2552 - page 1385

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Effect of Total Pressures on Structure and Photocatalytic Property of TiO
2
Thin Films
Deposited by Reactive DC Magnetron Sputtering
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Jindawan Singkot
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, Nirun Witit-anun
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, Surasing Chaiyakhun
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Abstract
Titanium dioxide (TiO
2
) thin films were deposited by reactive DC magnetron sputtering on silicon and
glass slide at different total pressure. A pure metallic titanium target was sputtered in a mixture of argon and
oxygen. The effect of the total pressure on the crystallinity, the surface morphology and the photocatalytic
property was investigated. The films were characterized by XRD and AFM. The photocatalytic activity was
evaluated by the measurement of the decomposition of methylene blue after UV irradiation. The results showed
that the crystal structure, surface morphology and photocatalytic activity of the deposited films were depended on
the total pressure. The film with high total pressure deposition shows the best photocatalytic activity.
Keyword
: Thin film; reactive DC magnetron sputtering; Titanium dioxide; photocatalytic
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