เอกสารการประชุมวิชาการและเสนอผลงานวิจัย มหาวิทยาลัยทักษิณ ครั้งที่ 19 2552 - page 122

„µ¦ž¦³»¤ª·µ„µ¦Â¨³Áœ°Ÿ¨Šµœª·‹´¥ ¤®µª·š¥µ¨´¥š´„¬·– ‡¦´ÊŠš¸É 19 ž¦³‹Îµže 2552
1
Ÿ¨ °Š˜ÎµÂ®œnŠª´ —»¦°Š¦´ÄœÂœª¦´«¤¸˜n°Ã‡¦Š¦oµŠ °Š¢d¨r¤µŠÅššµÁœ¸¥¤Å—°°„ÅŽ—r
š¸ÉÁ‡¨º°—oª¥ª·›¸ —¸Ž¸ ¦¸Â°‡˜¸¢ ¤„œ¸˜¦°œ ž{ ˜Á˜°¦·Š
Effect of Substrate Radial Position on Structure of TiO2 Thin Film
Deposited by DC Reactive Magnetron Sputtering
¡¹ÉŠ» žµœ«·¨µ1, œ·¦´œ—¦r ª·š· ˜°œ´œ˜r2*, »¦·Š®r ō¥‡»–3
Pungboon Pansila1, Nirun Witit-anun2*, Surasing Chaiyakun3
š‡´—¥n°
¢d ¨r¤µŠÅššµÁœ¸¥¤Å—°°„ÅŽ—rÁ‡¨º°—o ª¥¦³—¸Ž¸ ¦¸Â°„˜¸¢ ¤„œ¸ ˜¦°œ ž{˜Á˜°¦·Š —oª¥Â„p Ÿ¤
°µ¦r „°œ„´°°„Ž·Á‹œ Ÿ¨„µ¦«¹„¬µ¡ªnµ˜ÎµÂ®œnŠ„µ¦ªµŠª´ —»¦°Š¦´ÄœÂœª¦´«¤¸ ¤¸Ÿ¨˜n°Ã‡¦Š¦oµŠŸ¨¹„ °Š¢d¨r¤
š¸É Á‡¨º°Å—o Šµœª· ‹´¥œ¸Ê µ¤µ¦™Á‡¨º°¢d¨r¤ÅššµÁœ¸¥¤Å—°°„ÅŽ—r š¸É¤¸Ã‡¦Š¦oµŠŸ¨¹„°œµÁšœª´ —»¦°Š¦´
š¸É ŤnÄ®o ‡ªµ¤¦o°œ Á¤ºÉ°ªµŠª´ —»¦°Š¦´ š¸É˜ÎµÂ®œnŠ 40 mm Ĝœª¦´«¤¸ –³š¸É¡¢d¨r¤ÅššµÁœ¸¥¤Å—°°„ÅŽ—r
š¸É ¤¸Ã‡¦Š¦oµŠŸ¨¹„Ÿ¤°œµÁš/¦¼Åš¨r ¨³°´–“µœ š¸É˜ÎµÂ®œn Šª´ —»¦°Š¦´ÄœÂœª¦´«¤¸ Ášnµ„´ 0-20 mm ¨³
60-80 mm ˜µ¤¨Îµ—´ œ°„‹µ„œ¸Ê‡ªµ¤®œµÂ¨³‡ªµ¤®¥µŸ·ª °Š¢d¨r¤‹³¨—¨Š Á¤ºÉ°˜Î µÂ®œnŠª´ —»¦°Š¦´ÄœÂœª¦´«¤¸
Á¡·É¤ ¹Êœ ×¥‡ªµ¤®œµ¢d¨r¤‹³¨—‹µ„ 154.2 nm Áž}œ 113.8 nm ‡ªµ¤®¥µŸ·ª‹³¨—‹µ„ 5.6 nm Áž}œ 1.4 nm ¨³
œµ—Á„¦œ °Š¢d¨r¤¨—¨Š‹µ„ 74.5 nm Áž}œ 48 nm
‡ÎµÎµ‡´ : ¢d ¨r¤µŠ ŚšµÁœ¸¥¤Å—°°„ÅŽ—r ž{˜Á˜°¦·Š ¦¸Â°‡˜¸¢ ¤„œ¸˜¦°œ ž{ ˜Á˜°¦·Š °œµÁš
Abstract
TiO2 thin films were deposited by DC reactive magnetron sputtering using a mixture of Ar and O2 gases.
It was found that the crystalline structure strong depends on the radial position of the substrate. Anatase TiO2 thin
film were successfully obtained on a unheated Si(100) substrate located at a radial position of 40 mm. While
mixed phase of Anatase/Rutile and amorphous TiO2 films were deposited at radial positions of 0-20 mm and 60-
80 mm, respectively. In addition, it was found that, the thickness, roughness and grains size of deposited films
decreased with increasing radial position of the substrate. The films thickness decreased from 154.2 nm to 113.8
nm , roughness decreased from 5.6 nm to 1.4 nm and grains size decreased from 74.5 nm to 48 nm
Keywords: thin film; titanium dioxide; sputtering; reactive magnetron sputtering; anatase
1 œ· ·˜´ –”·˜«¹„¬µ, 2Ÿ¼onª¥«µ˜¦µ‹µ¦¥r, 3¦°Š«µ˜¦µ‹µ¦¥r £µ‡ª·µ¢d ·„r ‡–³ª·š¥µ«µ˜¦r ¤®µª·š¥µ¨´¥¼¦¡µ ‹.¨» ¦¸ 20131
* Corresponding author. Ú¦«´ ¡šr/Ú¦µ¦ 038103084Email-nirun@buu.ac.th.