156
Á°µ¦°o
µ°·
¡¹É
»
µ«·
¨µ, ·
¦´
¦r
ª·
·
°´
r
¨³ »
¦·
®r
Å¥»
. 2552. ¨
°Î
µÂ®n
ª´
»
¦°¦´
Ī¦´
«¤¸
n
°
æ¦o
µ
°¢d
¨r
¤µÅµÁ¸
¥¤Å°°År
¸É
笼
°o
ª¥ª·
¸
¸
¸
¦¸
°¸
¢ ¤¸
¦° {
Á°¦·
,
Ä
µ¦¦³»
¤ª·
µµ¦Â¨³Á°¨µª·
´
¥ ¤®µª·
¥µ¨´
¥´
¬·
¦´Ê
¸É
19
. 24-25 ´
¥µ¥ 2552.
¨µ.
·
¦´
¦r
ª·
·
°´
r
, ª»
·
¡«r
«µ»
¡·
¨³ ¥µ¤ ª¸
¦ª·
«»
¨. 2552. ¦³ÁµÃ¦Á¤¸
¥¤Á¨º
°o
ª¥Á·
{
Á°¦·
Î
µ®¦´
°»
µ®¦¦¤¥µ¥r
. Ä
µ¦¦³»
¤ª·
µµ¦Â¨³Á°¨µª·
´
¥ ¤®µª·
¥µ¨´
¥
´
¬·
¦´Ê
¸É
19
. 24-25 ´
¥µ¥ 2552.
¨µ.
Fujishima, A. and Honda, K. (1972). “Electrochemical photolysis of water at a semiconductor electrode,”
Nature
.
238, 37-38.
Fujishima, A., Rao, T.N and Tryk, D.A. (2000). “TiO
2
photocatalysts and diamond electrode,”
Electrochimica
Acta
. 45, 4683-4690.
Li, G.H., Yang, L., Jin, Y.X., and Zhang, L.D. (2000). “Structural and optical properties of TiO
2
thin film and
TiO
2
+ 2wt.% ZnFe
2
O
4
composite film prepared by r.f.
sputtering,”
Thin Solid Films
. 368, 163-167.
Löbl, P., Huppertz, M. and Mergel, D. (1994). “Nucleation and growth in TiO
2
films prepared by sputtering and
evaporation,”
Thin Solid Films
. 251, 72-79.
Pulker, H.K. (1984).
Coatings on Glass
. Elsvier Science Publishers B.V. 311.
Ritter, E. (1975). Dielectric film materials for optical applications.
Physics of thin films
. 1-49
Syarif, D. G., Miyashita, A., Yamaki, T., Sumita, T., Choi, Y., and Itoh, H. (2002). “Preparatin of anatae and rutile
thin film by controlling oxygen partial pressure,”
Applied Surface Science
. 193, 287-292.
Liu, Baoshun., Zhou, X., Zhou, Q., Li, Chunling., and He, X. (2005). “The Effect of partial pressure on the
structure and photocatalytic property of TiO
2
films prepared by sputtering,”
Materials Chemistry and
Physics
. 90, 207-212.
Takeda, S., Suzuki, S., Odaka, H. and Hosono, H. (2001). “Photocatalytic TiO
2
thin film deposited onto glass by
DC magnetron sputtering,”
Thin Solid Film
. 392, 338-344.
Wu, K.R., Wang, J.J., Liu, W.C., Chen, Z.S. and Wu, J.K. (2006). “Deposition of graded TiO
2
films featured both
hydrophobic and photo-induced hydrophilic properties,”.
Applied Surface Science.
255, 5829-5838.
Zeman. P. and Takabayashi, S. (2002). “Effect of total and oxygen partial pressures on structure of photocatalytic
TiO
2
films sputtered on unheated substrate,”
Surface and Coatings Technology
. 153, 93-99.
Zhao, X.T., K. Sakka, N. Kihara, Y. Takada, M. Arita. and Masuda, M. (2005). “Structure and Photo-Induced
Features of TiO
2
Thin Films Prepared by RF Magnetron Sputtering,”
Microelectronics Journal.
36,
549-551.